Tungsten Sputtering Target

1. Brand: XZY

2. Catalog: Tungsten product

3. Material: Tungsten

4. Purity: ≥99.95%

5. Density: 19.3 g/cm³

6. Shape: Plane target, Rotating target, Sputtering target, Square target, Tube target, Customized target with irregular shape.

7. Specification: Customized, Target weight≤300KG/PCS.

8. Surface: Cold rolled surface, Chemical cleaned surface, Polished surface

9. Application: Magnetron sputtering coating

10. Standard: ASTM B760, GB/T3875-83

11. Place Of Origin: Luoyang, China.

Product Introduction

Tungsten sputtering target, also known as tungsten target, is a product made of high-purity tungsten powder as raw material. It has a silvery-white metallic luster and excellent physical and chemical properties. The purity of the target is usually higher than 99.95%, the density can reach more than 19.25g/cm³, the melting point is 3410±20℃, and the boiling point is 5927℃. The melting point of tungsten target is extremely high, which is suitable for sputtering under high temperature conditions. It is often used in high-temperature resistant films, coating materials, etc. Specifically, tungsten target has a wide range of applications in the preparation of metal films, optical films, solar cells and other fields. It can be widely used in solar energy, glass, liquid crystal, electrical industry sputtering targets, LEDs and electronics industries. In these fields, the high purity and excellent physical and chemical properties of tungsten target can ensure that the coating has good electrical performance and stability.

Product Classification

Tungsten sputtering targets come in various shapes. According to their appearance and shape, they are mainly divided into tungsten flat targets and tungsten rotating targets, Long strip targets, square targets, round targets, tube targets, and special-shaped custom targets, etc. The shape of the target is mainly determined by the design and application requirements of the sputtering system. Common shapes include:

1) Flat targets:

It refers to circular targets and rectangular targets with a certain thickness.

Usually, circular targets or rectangular targets with a certain thickness are connected to the sputtering equipment through threads or other means, and the film layer is sputtered under vacuum conditions and attached to the substrate. Then, the film is processed by various means (etching) to meet different needs. They are suitable for a variety of sputtering equipment.

2) Rotating targets:

The rotating target material is a magnetron target. This target is made into a cylindrical shape, with a stationary magnet inside, and rotates at a slow speed. The advantage of the rotating target is high utilization rate (up to 70% or more), but the cost is relatively high.

3) Cylindrical planar magnetron sputtering target:

It combines the advantages of planar rectangular target and coaxial cylindrical target, with good coating uniformity and high target utilization.

4) Special-shaped target:

Non-standard shape target customized according to specific application requirements.

These targets of various shapes can adapt to different sputtering technologies and application scenarios, ensuring the uniformity and efficiency of thin film deposition.

Our Advantages

Generally speaking, the purity, density, microstructure, internal quality, welding quality, appearance quality and geometric dimensions of tungsten sputtering targets have an important impact on the quality of coating. Our advantages including:

1) Luoyang Rare Metal Research Materials Co., Ltd. can customize and produce tungsten targets of various specifications and shapes for users;

2) We use mature powder metallurgy technology and hot isostatic pressing technology for production;

3) We use high-quality billets for production;

4) The targets we produce have high purity, high density, uniform internal structure, no cracks and sand holes, no pores, no looseness and segregation, uniform composition, fine grains, bright surface, uniform color, accurate size, and excellent thermal conductivity, thereby ensuring high efficiency and high utilization of the targets.

5) Due to the use of hot isostatic pressing technology, larger target materials can be manufactured, and the weight of a single target can reach more than 300KG.

6) We can provide the tungsten targets with super high density. The conventional density of target materials is between 19g/cm³ and 19.2 g/cm³, but the target materials we produce by special processes have a density greater than 19.25g/cm³.

7) Our tungsten targets can withstand extreme high temperatures of 2000℃, with excellent quality and long service life.

Product Features

Features of tungsten sputtering targets include:

- High purity:

The purity of tungsten targets is usually higher than 99.95%. High purity helps improve the electrical properties of the coating and reduce the risk of circuit short circuit or damage.

- High density:

The density of the product after sintering and forging can reach more than 19.2g/cm³

- Good thermochemical stability:

They are not prone to volume expansion or contraction, nor are they prone to chemical reactions with other substances.

- Low resistance:

They have low resistance and will not cause unnecessary energy loss in the circuit.

- At the same time, it also has the characteristics of high melting point, high elasticity, high deflection force, low expansion coefficient, low vapor pressure, non-toxicity, non-radioactivity, and relatively reasonable cost. These characteristics make tungsten targets perform well in various applications

Product Application

Tungsten sputtering target can be used in many fields:

- Flat panel display:

It is used to manufacture coating materials in flat panel display.

- Solar cell:

It can provide high-quality coating.

- Integrated circuit:

It can improve the stability and reliability of the circuit.

- Semiconductor:

Tungsten targets are often used as sputtering targets for physical vapor deposition, and are used in the semiconductor field to make gate electrodes, connecting wiring, diffusion barriers, etc.

- Automotive glass:

It can improve its durability and optical properties.

- Microelectronics and memory:

It can provide high-quality coating materials for this field.

- X-ray tube:

It's used in the manufacture of X-ray tubes and used for the generation and acceleration of high-energy particle beams.

- Medical equipment (Such as X-ray and gamma-ray equipment).

As a target material, tungsten is mainly used to generate X-rays or as the focus of electron beam technology. Targets are key components in radiation source devices. Their function is to be hit by high-speed electrons to generate X-rays. Tungsten targets, due to their high melting point, high density and good thermal conductivity, can remain stable when bombarded by strong electron beams and are not easy to melt or damage, making them the preferred material in fields such as medical imaging and material analysis.

- Melting equipment: It's used for high-temperature components.

In summary, tungsten targets are mainly used in aerospace, rare earth smelting, electric light sources, chemical equipment, medical equipment, metallurgical machinery, melting equipment, petroleum, and other fields.